Bais Power Supply Single-Stage pulse bias power supply, Water Pressure More than or equal to 02Mpa 3m3h High Vacuum Magnetron Sputtering Machine, Heating System Controllable and adjustable from room temperature to 600 degreeC PID temperature control,...
Key Highlights
Available Variants
Technical Specifications
| Parameter | Value |
|---|---|
| Pump Time | 5*10-2pa Less than or equal to 5mins |
| Gas Control | Multi way sevenstar mass flow controller |
| Gas Pressure | 0.4-0.8Mpa |
| Vaccum System | Molecular Pump+Roots pump+Monoblock pump+Rotary vane pump+cryogenic pump is optional |
| Heating System | Controllable and adjustable from room temperature to 600 degreeC (PID temperature control) |
| Water Pressure | More than or equal to 0.2Mpa 3m3/h |
| Rotating System | Planetary rotation and revolution, frequency control |
| Ultimate Vaccum | 5x10-4pa |
| Bais Power Supply | Single-Stage pulse bias power supply |
| Chamber Structure | Vertical front door structure, rear vacuum system, material for vaccum chamber adopts high qualitySS |
| Water Temperature | Less than or equal to 25 DegreeC |
| Minimum Order Quantity | 1 Piece |